Plasma Processing for dry etching and deposition

Andreas Stamm (Oxford Instruments/ Plasma Technology) The talk gives an overview about different ways to use a cold plasma for applications in micro- and nanoelectronics like
  • Dry Etching RIE / ICP – RIE/ ALE
  • Plasma Deposition PECVD
  • Magnetron Sputtering
  • Atomic Layer Deposition ALD
  • Ion Beam Etching and Deposition
  • the growth of 1d and 2d materials
Many example applications will be shown.