Plasma Processing for dry etching and deposition
Andreas Stamm (Oxford Instruments/ Plasma Technology)
The talk gives an overview about different ways to use a cold plasma for applications in micro- and nanoelectronics like
- Dry Etching RIE / ICP – RIE/ ALE
- Plasma Deposition PECVD
- Magnetron Sputtering
- Atomic Layer Deposition ALD
- Ion Beam Etching and Deposition
- the growth of 1d and 2d materials
Many example applications will be shown.