Edgars Nitišs, Elza Liniņa, Andrejs Tokmakovs, Boris Poļakovs (ISSP UL)

Lithography is one of the most important technologies used today in the prototyping and manufacturing of electronic and photonic devices. Lithography makes it possible to create specific structures with very high precision. Depending on the resolution required, which can range from a few nanometers to a few centimeters, and the size of the devices, various lithography techniques are used: electron beam lithography (EBL), direct writing laser lithography (DWLL), optical mask lithography (OML), and more.

At present, the DWLL workflow has been implemented at the Institute of Solid State Physics, University of Latvia, which enables opportunities to implement different devices for prototyping and research in photonics, nano/microelectronics, microfluidics, THz optics, etc. With DWLL method, a focused laser beam “writes” on structure’s resist.


During the presentation, the DWLL flow implemented at the ISSP UL will be explained, possibilities and limitations of the technique will be reflected upon by using implemented examples. The results were obtained with the support of VPP IMIS2 1st project "Photonics and Materials for Photonics” and ISSP UL Students and Young Scientists project No SJZ2015/15.