Martin Kirchner (Raith GmbH)
Electron beam lithography is a key technology for nano research. This is due to high writing resolution (10nm or below) and flexibility (mask less technique).
Raith’s product portfolio includes electron beam lithography tools covering a wide performance range. But which tool fits to which application?
The presentation will review Raith’s new eWrite technology and the VOYAGER tool using this technology. Key applications will be explained, specifically including large area applications. Examples from the fields of electronics and photonics will be shown.
Stitch error free writing using writing on the fly techniques is also available with the VOYAGER.
The benefits of this technology for research will be demonstrated.