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Our laboratory uses various methods for thin films deposition. There are different physical evaporation (thermal, pulsed laser deposition etc.) and magnetron sputtering (DC, RF, HiPIMS) technologies. The base for providing these deposition technologies is multifunctional cluster tool SAF developed and built by SIA "Sidrabe". Besides that we are using several stand-alone a magnetron sputtering and evaporation units.

To test and research obtained films our experimental possibilities include but are not limited to several techniques such as scanning and transmission electron microscopies (SEM/TEM), scanning probe microscopies (AFM/STM), and confocal microscopy (CM) for morphology characterization. X-ray diffraction (XRD), synchrotron-radiation X-ray absorption spectroscopy (XAS/EXAFS/XANES), electron energy loss spectroscopy (EELS) and X-ray photoemission spectroscopy (XPS) for atomic and electronic structure investigations. Materials composition can be probed by X-ray fluorescence (XRF), XPS, EELS and XAS methods.

Our laboratory is also involved in the teaching process at the University of Latvia and provides students with opportunities to participate in research activities during Bachelor, Master and Doctoral level programs.