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Plasma Processing for dry etching and deposition
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Andreas Stamm (Oxford Instruments/ Plasma Technology)

The talk gives an overview about different ways to use a cold plasma for applications in micro- and nanoelectronics like

  • Dry Etching RIE / ICP – RIE/ ALE
  • Plasma Deposition PECVD
  • Magnetron Sputtering
  • Atomic Layer Deposition ALD
  • Ion Beam Etching and Deposition
  • the growth of 1d and 2d materials

Many example applications will be shown.